To be the world's leading provider of innovative and sustainable products and services for use in erosion and sediment control, stormwater management and low impact development to protect our soil, water and environment;
To continually engage, develop and inspire our employees to reach their fullest potential;
To provide the highest level of customer service through reliability, quality and value.
WHO WE ARE
We are the inventors of the compost filter sock.
After years of research and development, Filtrexx® Soxx™ technology has expanded into stormwater management, sediment control, erosion control, pollutant removal and living walls. Our sustainable solutions, built around our proprietary Soxx™ technology, are used in diverse applications such as perimeter control, inlet protection, check dams, slope interruption, runoff diversion, sediment trap, channel protection, bank stabilization, living walls, green roofs, filtrations systems, and more. Headquartered in Akron, OH, Filtrexx has an extensive network of partners and distributors to serve customers across the globe.
WHAT WE DO
We provide design and engineering advice to utilize our patented Soxx technology.
Engineered as the superior alternative to silt fence, our original Filtrexx® SiltSoxx™ is the tubular mesh device used to contain composted media for a variety of erosion control and stormwater management applications. Since 2001, our Soxx portfolio has grown exponentially to cover other sediment & erosion control, pollutant removal, stormwater management, stabilization, living walls and gardening applications.
HOW WE DO IT
We collaborate closely with our customers to identify the most appropriate Soxx technology for each specific application.
From selecting the proper Filtrexx® Media™ — filter, alternate, growing — to identifying the most suitable Filtrexx® Mesh™ — opening size, configuration type, strength, and functional longevity — each Soxx solution is carefully designed and engineered in-house by a team of experts to guarantee superior performance on the field.